Glassware with silicone support

ABSTRACT

A glass dish suitable for use in cooking applications is provided. The glass dish comprises a substantially homogenous glass body, a channel formed in a bottom surface of the glass body and a silicone support. The channel has an open end and an inner surface comprised of a substantially planar bottom wall, an inner sidewall and an outer sidewall. The channel has a predetermined depth D o , and an open end of the channel has a predetermined width W o . The silicone support is comprised of a protruding extent and an interior extent. The interior extent is disposed within the channel and directly contacts a portion of the inner surface and is adhered to the inner surface of the channel by chemical adhesion. The protruding extent protrudes beyond the open end of the channel.

CROSS-REFERENCE TO RELATED APPLICATIONS

Not applicable.

FEDERALLY SPONSORED RESEARCH OR DEVELOPMENT

Not applicable.

TECHNICAL FIELD

The invention relates to glass houseware. More particularly, theinvention relates to a glass dish having a silicone support disposedwithin a channel formed therein.

BACKGROUND OF THE INVENTION

Glassware such as glass houseware may slide on smooth surfaces such as acountertop or table causing damage to the smooth surfaces as well aspossible spillage of the contents of the glassware. Various devices havebeen employed in an attempt to prevent or minimize this tendency. Forexample, an india rubber ring has been placed in a recess on the bottomof hollow ware. The india rubber ring forms a non-slip barrier betweenthe hollow ware and furniture or other surfaces upon which the item isto be rested. However, use of india rubber in connection with glasswarehas numerous disadvantages. For example, india rubber has significantdisadvantages with respect to its use in high temperature applications.In particular, india rubber is susceptible to deformation and meltingwhen subjected to high temperatures, thereby limiting its effective useon glassware used in conventional ovens, microwaves and other hightemperature environments. Accordingly, there exists a need for glasswarehaving a non-slip surface which can be used in both low and hightemperature environment.

Silicone generally exhibits good non-slip characteristics, has a hightolerance to elevated temperatures and readily accepts colorants anddyes. While it is believed that elastomers such as silicone have beenused to some degree on ceramics, ceramic dishware inherently has certainlimitations. In particular, the brittleness and certain physical andthermal characteristics of ceramic dishware, not generally associatedwith glass dishware, make the use of ceramic dishware undesirable andimpractical in certain cooking applications. Moreover, use of siliconeas a non-slip surface for ceramic products has several disadvantages.For example, silicone has very limited natural adhesion to ceramicmaterial. Accordingly, it is often necessary to apply an intermediateglass-like coating to the ceramic item to achieve some degree ofadhesion between the silicone and the ceramic. The need for such anintermediate agent to provide the necessary bonding characteristicscreates a potentially less reliable adhesion, and increases overallproduct cost and manufacturing time. Therefore, a needs exists toprovide for a substantially homogenous glass dish with a siliconesupport that adheres directly to the dish without an intermediateadhesive or bonding agent.

It is also known to apply silicone to glass to provide a protectivesurface for fragile glassware items as for example is shown in U.S. Pat.No. 4,860,906 to Pellegrini et al. U.S. Pat. No. 4,860,906 is directedto a thin-walled glass container that is subjected to intermittentperiods of rapid heating and cooling, wherein preferably substantiallythe entire exterior surface of the glass container is coated by asilicone elastomer safety applied thereto by using conventional dippingand spraying techniques. While the application of silicone to glassdescribed in U.S. Pat. No. 4,860,906 is suitable for protecting thinglassware from breakage, the use of silicone described therein hassignificant disadvantages in non-slip applications in which a coating isnot required or desirable.

For example, the use of silicone coating as a non-slip surface forglassware can be costly in view of the relative material costs,particularly if the silicone is applied using traditional dipping,spraying or coating techniques such as is taught by U.S. Pat. No.4,860,906. Moreover, certain difficulties arise when attempting to use atargeted silicone appliqué as a non-slip surface, that may not occurwith silicone coatings such as that described in U.S. Pat. No.4,860,906. In particular, silicone has an undesirable tendency to peelaway from glass when shear forces are applied thereto, thereby exposingboth the glassware and the silicone to damage. Glassware such ashouseware is also typically subjected to extensive wear during ordinaryuse that may result in the silicone suffering mechanical damage. Thus, aneed exists to minimize the quantity of silicone used, while providingsufficient silicone to benefit from desirable non-slip qualities ofsilicone. A need also exists to provide a mechanism that protects thesilicone application from physical damage in finished glasswareproducts.

The present invention is provided to solve the problems discussed aboveand other problems, and to provide advantages and aspects not providedby prior glassware. A full discussion of the features and advantages ofthe present invention is deferred to the following detailed description,which proceeds with reference to the accompanying drawings.

SUMMARY OF THE INVENTION

The present invention provides a dish with a silicone support, and amethod of manufacturing the same. In one embodiment, a glass dish isprovided. The dish is comprised of a substantially homogenous glassbody, a channel formed in a bottom surface of the glass body, and asilicone support disposed within the channel. The glass body defines atleast one side wall, an upper extent and a bottom surface. The channelhas an open end and an inner surface, and the inner surface has a bottomwall, an inner sidewall and an outer sidewall. The open end of thechannel has a predetermined width W_(o). The channel also has apredetermined depth D_(o). The channel conforms to the relationshipW_(o)/D_(o) of 3 to 13. The silicone support includes a protrudingextent and an interior extent. The interior extent of the siliconesupport is disposed in the channel, and at least a portion of theinterior extent directly contacts the inner surface of the channel. Thatportion of the silicone support that contacts the inner surface of thechannel is adhered to the inner surface of the channel by chemicaladhesion. The protruding extent of the silicone support protrudes beyondthe open end of the channel.

According to another embodiment of the present invention, a glass dishis provided that includes a body, a channel in the bottom surface of thebody, and a silicone support disposed within the channel. The channelhas an open end, a substantially planar bottom wall, an inner sidewalland an outer sidewall. The channel also has a predetermined depth D_(o)in the range of 0.040 to 0.080 inches. The open end of the channel has apredetermined width W_(o) in the range of 0.25 to 0.50 inches. Thechannel conforms to the relationships W_(o)/D_(o) of 3 to 13 andD_(o)/T_(o) of 0.2 to 0.6. The silicone support has a melting pointgreater than 350° and includes an interior extent and a protrudingextent. Further, the protruding extent of the silicone support protrudesat least 0.010 inches beyond the open end of the channel.

In another embodiment of the present invention, a microwavable glassdish is provided. The glass dish has a substantially homogenous glassbody, a channel formed in at least a portion of the bottom surface ofthe glass body, and a silicone support disposed within the channel. Theglass body has a first thermal insulative value. The silicone supporthas a melting point greater than 350° F. The interior extent of thesilicone support of the silicone support is disposed in the channel, andat least a portion of the interior extent of the silicone supportdirectly contacts the inner surface of the channel. That portion of thesilicone support that contacts the inner surface of the channel isadhered to the inner surface of the channel by chemical adhesion.Further, the protruding extent of the silicone support protrudes beyondthe open end of the channel. The silicone support has a second thermalinsulative value, and the second thermal insulative value is greaterthan the first thermal insulative value.

In yet another embodiment of the present invention, a method ofmanufacturing a glass dish with a silicone support is provided. Themethod comprises providing a glass dish defined by at least one sidewall and a bottom surface. The glass dish has a circumferential channelformed in the bottom surface. The channel of the glass dish has aninternal volume. The glass dish is rotated at a first rotation speedthrough approximately 360 degrees, and a first predetermined volume ofsilicone is applied in an uninterrupted flow at first flow rate to thechannel of the dish. The first predetermined volume of silicone isgreater than the internal volume of the channel so that the siliconefills the channel and protrudes beyond an upper extent of the channel.The first rotation speed and the first flow rate are coordinated toachieve a first application density. The glass dish is then rotated at asecond rotation speed beyond approximately 360 degrees, and a secondpredetermined volume of silicone is applied in an uninterrupted flow ata second flow rate to the channel of the dish to form an overlap of theapplied silicone. The second rotation speed and the second flow rate arecoordinated to achieve a second application density which is less thanthe first application density. The first predetermined volume ofsilicone occurs at the same time that the glass dish is rotated at thefirst rotation speed. The step of applying the second predeterminedvolume of silicone occurs at the same time as the step of rotating theglass dish at the second rotation speed. The method also includes curingthe silicone to form a substantially seamless silicone support.

Other features and advantages of the invention will be apparent from thefollowing specification taken in conjunction with the followingdrawings.

BRIEF DESCRIPTION OF THE DRAWINGS

The components in the drawings are not necessarily to scale, emphasisinstead being placed upon clearly illustrating the principles of thepresent invention.

FIG. 1 is a perspective view of the glass houseware with siliconesupport according to one embodiment of the present invention;

FIG. 2 is a side view of the glass houseware with silicone support shownin FIG. 1;

FIG. 3 is a bottom view of the glass houseware with silicone supportshown in FIG. 1;

FIG. 4 is a cross-sectional view of the glass houseware with siliconesupport shown in FIG. 1 taken through the line 4-4;

FIG. 5 is an enlarged cross-sectional view of the glass houseware withsilicone support shown in FIG. 4;

FIG. 6 is an enlarged cross-sectional view of the glass houseware shownin FIG. 4 without the silicone support; and

FIG. 7 is an enlarged cross-sectional view of another embodiment of thepresent invention without the silicone support.

DETAILED DESCRIPTION

While this invention is susceptible of embodiments in many differentforms, there is shown in the drawings and will herein be described indetail preferred embodiments of the invention with the understandingthat the present disclosure is to be considered as an exemplification ofthe principles of the invention and is not intended to limit the broadaspect of the invention to the embodiments illustrated.

Referring now in detail to FIGS. 1-7, there is shown generally a glassdish 10. Glass dish 10 includes a body 12, channel 14 and siliconesupport 16. Glass dish 10 may be any type of glassware and isillustrated in the figures as a preparation bowl. For example, glassdish 10 may be a cup, including a measuring cup, another type of bowl, aplatter, vessel, container or other glass houseware without departingfrom the present invention.

Body 12 defines at least one side wall 18, an upper extent 20 and abottom surface 22 and is preferably formed from substantially homogenousglass. It will be appreciated that substantially homogenous glassincludes pure glass as well as glass having some particulate or otheradditive or material, but is not intended to include ceramics. In onepreferred embodiment the glass is suitable for use in microwaveapplications. Accordingly, the body may be formed from borosilicateglass, soda lime glass or other glass as known to those of skill in theart, and is preferably formed from the same glass as used in productssold under the Pyrex® brand name.

Body 12 preferably has a thickness T_(o) in the range of 0.14 to 0.20inches. However, it is contemplated that body 12 of the presentinvention have any thickness suitable for cookware and which may conformto the relative relationships described herein. As shown in FIGS. 5-7,T_(o) does not need to be constant through the entire bottom surface ofbody 12. While body 12 is illustrated in FIGS. 1-3 as being a generallyelliptical or egg-shaped bowl with a single side wall 18, it iscontemplated that the body 10 can be of other geometries includinggeometries having multiple side walls.

Channel 14 can be formed in all or at least a portion of the bottomsurface of the glass body and is configured to receive the silicone thatforms the silicone support 16. Channel 14 acts as a target area for easeof application of the silicone support and protects the silicone support16 from damage during use of dish 10. According to the presentinvention, a substantial portion of silicone support 16 is disposedwithin channel 14, and is thus shielded from direct contact with manyoutside forces. As shown in FIGS. 1-7, the cross-sectional profile ofchannel 14 of the present invention is generally non-arcuate. Accordingto the present invention, the target area for application of thesilicone is improved as the channel 14 conforms to a more rectangularcross-sectional profile. Furthermore, a more rectangular cross-sectionprovides better protection of the silicone support 16 from mechanicaldamage than those channels configured to form an arcuate cross-section.

Channel 14 has an open end 24 and an inner surface 25. Inner surface 25is defined by a bottom wall 26, an inner sidewall 28 and an outersidewall 30. While it is desirable that the bottom wall 26 intersectsthe sidewalls 28 and/or 30 at substantially a right angle, some radiusat the intersection is typically present to aid in the forming process.Accordingly, channel 14 preferably includes a first inner radial panel32, a second inner radial panel 34, a first outer radial panel 36 and asecond outer radial panel 38. First inner radial panel 32, second innerradial panel 34, first outer radial panel 36 and second outer radialpanel 38 each have a relatively small radius. In one preferredembodiment, the radii of each of these panels 32, 34, 36 and 38 isapproximately 0.40 R. According to the present invention, bottom wall 26is substantially planar such that the bottom wall 26 is disposedgenerally parallel to a surface upon which the dish may rests.

In one embodiment, inner and outer sidewalls 28 and 30 of channel 14 arealso generally planar. In that embodiment, outer sidewall 30 and innersidewall 28 each form an angle α between approximately 85 and 90 degreeswith respect to a plane defined by bottom wall 26. As shown in FIG. 7,in one embodiment, side walls 28 and 30 and bottom wall 26 form asubstantially rectangular cross-sectional profile.

Certain geometric factors are useful in describing the configuration ofthe channel of the present invention. As illustrated in FIGS. 5 and 6,channel 14 has an open end width W_(o), a bottom wall width W_(b) and adepth D_(o). Open end width W_(o) is in the range of approximately 0.25to approximately 0.50 inches, bottom wall width W_(b) is in the range of0.10 to 0.35 inches, and a depth D_(o) in the range of approximately0.04 to approximately 0.08 inches. More preferably, depth D_(o) is inthe range of 0.045 to 0.05 inches, and most preferably depth D_(o) is0.047 inches. Most preferably, the open end width W_(o) of the channelis 0.415 inches or approximately 0.4 inches. Channel 14 generallyconforms to the relationship W_(o)/D_(o) is in the range of 3 to 13, andmore preferably is in the range of 8 to 10, and most preferably about10. Preferably, open end width W_(o), bottom wall width W_(b) and depthD_(o) are constant throughout the entire profile of the channel.However, it is contemplated by the present invention that onlypredetermined portions of the channel profile conform to thesedimensions.

In one embodiment of the present invention, channel 14 conforms to theperimeter contour of the bottom surface 22 of the dish. For example, thebottom surface of the embodiment illustrated in FIGS. 1-7 is generallycircular. Accordingly, channel 14 is configured as a ring. In theembodiment shown in FIGS. 1-7, the ring is circumferentially disposedwithin bottom surface 22 of body 12. Alternatively, channel 14 may beconfigured as a square, rectangular or other symmetric or asymmetricshape.

In providing a dish according to the present invention, it is desirablethat the dimensions of channel 14 not diminish the mechanical strengthof body 12. To assist in accomplishing this, the depth of the channelD_(o) and the thickness of the glass T_(o) preferably conform to therelationship D_(o)/T_(o)=0.2 to 0.6, and most preferably conform to therelationship D_(o)/T_(o)=0.24.

Silicone support 16 provides a contact surface with a table, countertopor other work surface and aids in providing a non-slip quality of thedish 10. The physical properties of silicone make it particularlysuitable for application in the present invention. In particular,silicone is characterized by its resistance to heat in temperatures inexcess of 500° F. In one embodiment the silicone support has a meltingpoint of up to 600° F. This heat stability helps to minimize cracking,melting or delaminating in high temperature environment. Silicone alsoreadily accepts colorants and dyes, and is resistant to discoloration,making it aesthetically desirable. Silicone support 16 is preferablycomposed of LIM silicone, such as LIM8040 manufactured by the GeneralElectric Company or some variant thereof. However, it is contemplated bythe present invention, that silicone support be any silicone formulationsuitable for use in cooking environments without departing from thepresent invention.

In some applications, silicone support 16 may act as an insulatingtrivet. In such instances, silicone support 16 thermally insulates asurface upon which the dish 10 rests from body 12. For example, if dish10 is a glass dish and its food contents are heated in a microwave oven,microwave energy heats the contents of dish 10. The glass body reactswith microwave energy only to a certain degree, and has certain has athermal insulative value. The primary warming of the glass will bethrough the warmed food contents. Silicone itself is not stronglyinteractive with microwave energy, and has a greater thermal insulativevalue than the glass. In this case, the glass will act as a barrierbetween the food contents and the silicone support. Silicone support 16also has a soft non-marring quality.

Silicone support 16, in one embodiment, is a continuous, uninterruptedand substantially seamless silicone layer. Silicone support 16 includesa protruding extent 17 and an interior extent 19. All or at least aportion of interior extent 19 of silicone support 16 directly contactsinner surface 25 of channel 14, and there is no separate intermediatebonding agent between interior extent 19 of silicone support 16 andchannel 14. Preferably, there is little or no gap between interiorextent 19 and the inner surface 25 of channel 14. According to thepresent invention, all or at least a portion of interior extent 19 ofsilicone support 16 is disposed within and is adhered and chemicallybonded to all or at least a portion of the inner surface 25 of channel14. Silicone support 16 is adhered to channel 14 by chemical adhesion.In one embodiment, silicone support 16 is held in place solely bychemical adhesion, and is not assisted by mechanical means. However, itis contemplated that the channel 14 be configured to provide additionalmechanical support to assist in holding and further protecting siliconesupport 16 within channel 14.

In a preferred embodiment, protruding extent 17 of the silicone supportforms a reverse meniscus 40 at the farthest point at which it protrudes.This meniscus is naturally created during the silicone applicationprocess. Preferably, protruding extent 17 protrudes along the channel toa substantially uniform height beyond the open end 24 of channel 14,H_(o). This uniformity will provide both structural stability of dish 10and improved aesthetics. In a preferred embodiment, height H_(o) is atleast 0.01 inches, and most preferably in the range of approximately0.02 to approximately 0.05 inches. H_(o) can be greater than 0.05 inchesdepending on the viscosity of the silicone and the interrelated abilityof the silicone to flow, among other factors.

It should be understood that while the described embodiment of thepresent invention is directed to a silicone support adhered to a ringshaped channel on the bottom surface of a dish, the channel may bedisposed in other locations on the dish or in configurations other thana ring. For example, the channel may be situated on the handle of theproduct. In another embodiment, the silicone support may be applied tothe lid of a product to reduce noise when placing it on the base of theproduct. There may be several separate channels spaced apart around thecircumference of the lid. Thus, the channel does not need to becontinuous. The channel need not be a ring or even arcuate. For example,one or a series of relatively-short and linear channels, or severalspaced-apart rounded areas may be utilized.

The present invention also includes a method of manufacturing a glassdish with a silicone support. The method is intended to produce a glassdish with silicone support as described herein, wherein the siliconesupport is substantially seamless in appearance. Generally, the methodof the present invention comprises the step of providing a glass dishdefined by at least one side wall and a bottom surface, and having acircumferential channel formed in the bottom surface. The channel of theglass dish has an internal volume. The glass dish is rotated at a firstrotation speed through approximately 360 degrees, and a firstpredetermined volume of silicone is applied in an uninterrupted flow atfirst flow rate to the channel of the dish. The first predeterminedvolume of silicone is greater than the internal volume of the channel sothat the silicone fills the channel and protrudes beyond an upper extentof the channel. The first rotation speed and the first flow rate arecoordinated to achieve a first application density. The glass dish isthen rotated at a second rotation speed beyond approximately 360degrees, and a second predetermined volume of silicone is applied in anuninterrupted flow at a second flow rate to the channel of the dish toform an overlap of the applied silicone. The second rotation speed andthe second flow rate are coordinated to achieve a second applicationdensity which is less than the first application density. The firstpredetermined volume of silicone occurs at the same time that the glassdish is rotated at the first rotation speed. The step of applying thesecond predetermined volume of silicone occurs at the same time as thestep of rotating the glass dish at the second rotation speed. The methodalso includes curing the silicone to form the substantially seamlesssilicone support.

More specifically, a glass dish may be formed or manufactured throughconventional forming processes into a shape that includes a channelformed therein. The glass dish is then heat treated in its standardprocesses to impact appropriate physical and thermal properties for thedish's intended use. Preferably the resulting channel will have adefined circumference, and have an internal volume being defined with bysidewalls and a bottom wall. However, it is understood that the channelmay define any shape suitable for the geometry of the dish.

The finished dish blank is disposed on a fixture capable of rotation atvarying rotation speeds, and is rotated at a first predetermined speed.With a generally circular dish, this rotation permits a stationaryapplicator to apply silicone to all sections of the channel. The dish isrotated through approximately 360 degrees at the same rotation speed.

During this rotation, a predetermined and precise volume of a siliconeis deposited into the channel. Because of its low viscosity, thesilicone channel directs the movement of the silicone, thereby aiding inconforming the silicone to the shape of the channel. The channel alsoaids in having the silicone form a substantially perfect circle ofmaterial. The silicone may be applied through pressurized application,optionally by use of a precision nozzle. The silicone is fed by apumping system from a reservoir. The predetermined volume of silicone isgreater than the internal volume of the channel. Because the volume ofsilicone applied is greater than the volume of the channel, the siliconefills the channel and, when application is complete, protrudes beyondits upper extent to form a reverse meniscus. In the preferredembodiment, the volume of silicone applied is 10 to 20 percent greaterthan the volume of the channel. The silicone is applied in anuninterrupted flow at a flow rate. The rotation speed and the flow rateoperate together to achieve an application density. The applicationdensity is the volume of silicone applied per millimeter ofcircumference of the channel and is determined by dividing the flow rateby the rotation speed. Thus, there is an inverse proportionalrelationship between flow rate and rotation speed.

Once the dish has been rotated approximately 360 degrees, more siliconeis applied to the channel, but the application density is lowered. Bythat, the volume of silicone applied per millimeter of circumference ofthe channel is lessened so that there is less silicone in a given area.The additional silicone applied after the dish has been rotatedapproximately 360 degrees forms an overlap of silicone. Reducing theoverlap of silicone reduces the likelihood of forming a visible seam onthe silicone.

According to the present invention, various methods of reducing theapplication density may be employed. For example, the flow rate of thesilicone may be lowered while the rotation speed of the dish is heldconstant. Alternatively, the rotation speed of the dish may be increasedwhile the flow rate of the silicone is held constant. Further, therotation speed of the dish may be increased and the flow rate of thesilicone lowered. Thus, it will be understood that lowering theapplication density may be accomplished by any method of lowering thevolume of silicone applied per distance along the dish.

Once the overlap has been formed, the silicone is cured in an oven or byother means known to those of skill and at a prescribed time andtemperature as suitable for such purposes. Preferably, the curing willtake place in an oven at 400° F. for between 5 and 10 minutes. Thecuring process causes the silicone to harden and impacts the finalphysical and chemical properties to the material.

While the specific embodiments have been illustrated and described,numerous modifications come to mind without significantly departing fromthe spirit of the invention, and the scope of protection is only limitedby the scope of the accompanying Claims.

1. A glass dish suitable for use in cooking applications, the glass dishcomprising: a substantially homogenous glass body defining at least oneside wall, an upper extent and a bottom surface; a channel formed in thebottom surface of the glass body, the channel having an open end and aninner surface, the inner surface comprising a bottom wall, an innersidewall and an outer sidewall, the channel having a predetermined depthD_(o), and the open end of the channel having a predetermined widthW_(o), the channel conforming to the relationship W_(o)/D_(o)=3 to 13;and a silicone support comprising a protruding extent and an interiorextent, the interior extent of the silicone support being disposedwithin the channel, at least a portion of the interior extent of thesilicone support directly contacting at least a portion of the innersurface and being directly adhered to at least a portion of the bottomwall, the inner sidewall and the outer sidewall of the inner surface ofthe channel by direct chemical adhesion of the silicone support to theinner surface of the channel without a separate bonding agent, andwherein the protruding extent of the silicone support protrudes beyondthe open end of the channel.
 2. The dish of claim 1 wherein the body isformed from one of either borosilicate glass or soda lime glass.
 3. Thedish of claim 1 wherein the predetermined width W_(o) of the open end ofthe channel is substantially constant.
 4. The dish of claim 1 whereinthe channel contours to the shape of the bottom surface.
 5. The dish ofclaim 1 wherein at least one of the inner and outer sidewalls of theinner surface of the channel is generally planar.
 6. The dish of claim 5wherein the bottom wall is substantially planar, and the generallyplanar portion of at least one of the inner and outer sidewalls forms anangle between 85 degrees and 90 degrees with respect to the bottom wall.7. The dish of claim 1 wherein a cross-sectional profile of the innersurface of the channel is generally non-arcuate.
 8. A glass dishsuitable for use in cooking applications, the glass dish comprising: asubstantially homogenous glass body defining at least one side wall, anupper extent and a bottom surface having a predetermined thicknessT_(o); a channel formed in the bottom surface of the body, the channelhaving an open end and an inner surface, the inner surface comprising asubstantially planar bottom wall, an inner sidewall and an outersidewall, the channel having a predetermined depth D_(o) in the range of0.040 to 0.080 inches and the open end of the channel having apredetermined width W_(o) in the range of 0.25 to 0.50 inches, thechannel conforming to the relationships W_(o)/D_(o)=3 to 13 andD_(o)/T_(o)=0.2 to 0.6; and a silicone support comprising a protrudingextent and an interior extent, the interior extent of the siliconesupport disposed within the channel, at least a portion of the interiorextent of the silicone support directly contacting at least a portion ofthe inner surface and being directly adhered thereto by chemicaladhesion of the silicone support to at least a portion of the bottomwall, the inner sidewall and the outer sidewall of the inner surface ofthe channel formed in the glass body without a separate bonding agent,wherein the protruding extent of the silicone support extends to aheight H_(o) of at least 0.010 inches beyond the open end of thechannel, the silicone support having a melting point greater than 350°F.
 9. The dish of claim 8 wherein the width W_(o) of the channel isapproximately 0.4 inches.
 10. The dish of claim 9 wherein the depthD_(o) of the channel is in the range of 0.045 to 0.05 inches.
 11. Thedish of claim 8 wherein the channel conforms to the relationshipW_(o)/D_(o)=8 to
 10. 12. A microwavable glass dish suitable for use inmicrowave cooking applications, the glass dish comprising: asubstantially homogenous glass body defining at least one side wall, anupper extent and a bottom surface, the glass body having a first thermalinsulative value; a channel formed in at least a portion of the bottomsurface of the glass body, the channel having an open end and an innersurface, the inner surface comprising a bottom wall, an inner sidewalland an outer sidewall; and a silicone support comprising a protrudingextent and an interior extent, the interior extent of the siliconesupport disposed within the channel, at least a portion of the interiorextent of the silicone support directly contacting at least a portion ofthe inner surface and being directly adhered to the inner surface of thechannel by direct chemical adhesion of the silicone support to at leasta portion of the bottom wall, the inner sidewall and the outer sidewallof the inner surface of the channel without a separate bonding agent,wherein the protruding extent of the silicone support protrudes beyondthe open end of the channel, wherein the silicone support has a meltingpoint greater than 350° F., and wherein the silicone support has asecond thermal insulative value, the second thermal insulative valuebeing greater than the first thermal insulative value.
 13. The dish ofclaim 12 wherein the protruding extent of the silicone support protrudesto a height H_(o) of at least 0.01 inches beyond the open end of thechannel, the channel has a width W_(o) in the range of 0.25 to 0.50inches, the channel has a depth D_(o) in the range of 0.045 to 0.050inches, and the body has a thickness T_(o), the dish conforming to therelationship D_(o)/T_(o)=0.2 to 0.6.